Chemical Engineering Internship

ASMLZuidoost-Noord-BrabantEURESzveřejněno 28. 08. 2026

Chemistry | chemical engineering internship: Cleanliness data insights

Beschrijving Introduction

The Defectivity department within ASML's Development & Engineering organization helps ensure that advanced lithography systems meet strict cleanliness requirements. In Veldhoven, the Process & Cleanliness Control team supports the development, manufacturing, assembly, and cleaning of critical system components. As the intern, you will help improve the understanding of contamination behavior in field-returned parts. Your work will contribute to identifying patterns, supporting preventive actions, and improving system performance. This Chemistry | Chemical Engineering internship: cleanliness data insights offers a unique opportunity to combine data analysis with applied chemistry in a highly innovative environment.

Your assignment

During this internship, you will support the continuation of an existing project focused on cleanliness verification data. You will collect, organize, and analyze information received from suppliers regarding field-returned parts. The objective is to establish meaningful correlations between cleanliness data and hardware performance, helping the team identify improvement opportunities and prevent future contamination issues. Your main responsibilities will be:

  • Build and maintain a structured database of cleanliness-related data
  • Collect and organize supplier data from field-returned components
  • Analyze trends, correlations, and performance-related findings
  • Create calculations, visualizations, and reports to present insights
  • Investigate potential causes of contamination-related issues
  • Support recommendations for preventive improvement actions
  • Learn and apply cleanliness verification methods through practical training

This is a bachelor/master non-thesis internship for minimum 6 months, minimum 4 days per week (4 days on-site). The start date of this internship is as of October 2026 onwards.

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